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Atomfair High Purity Nickel Silicon Alloy Sputtering Target (Ni/Si 97/3 wt%, 4N Purity)
This Nickel Silicon (NiSi) alloy sputtering target offers high purity (99.9%) with a precise composition of 97% nickel and 3% silicon by weight. Ideal for thin film deposition applications in semiconductor and coating industries. The target comes in a standard disc shape with excellent uniformity.
Description
This Nickel Silicon (NiSi) alloy sputtering target offers high purity (99.9%) with a precise composition of 97% nickel and 3% silicon by weight. Ideal for thin film deposition applications in semiconductor and coating industries. The target comes in a standard disc shape with excellent uniformity.
| Material | Composition | Purity | Dimensions | Form | Packaging |
|---|---|---|---|---|---|
| Nickel Silicon Alloy | Ni/Si = 97/3 wt% | 99.9% (4N) | ฯ80 ร 6mm | Disc | 1 piece per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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