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Atomfair High Purity Bismuth Aluminum Alloy Sputtering Target (Bi/Al 90/10 wt%, 99.5%)
This Bismuth Aluminum (Bi/Al) alloy sputtering target offers high purity (99.5%) with a precise 90/10 wt% composition. Ideal for thin film deposition applications, it is manufactured using powder metallurgy for consistent quality. The target comes in a standard rectangular plate form for easy handling and installation.
Description
This Bismuth Aluminum (Bi/Al) alloy sputtering target offers high purity (99.5%) with a precise 90/10 wt% composition. Ideal for thin film deposition applications, it is manufactured using powder metallurgy for consistent quality. The target comes in a standard rectangular plate form for easy handling and installation.
| Material | Composition | Purity | Dimensions (mm) | Manufacturing Process | Packaging | Pack Size |
|---|---|---|---|---|---|---|
| Bismuth Aluminum Alloy | Bi/Al = 90/10 wt% | 99.5% | 50 × 50 × 2 | Powder Metallurgy | Plate | 1 pc |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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