Description

Hafnium Silicide (HfSi₂) is an advanced inorganic compound composed of hafnium and silicon, known for its exceptional thermal stability and electrical conductivity. This high-purity material is synthesized under controlled conditions to ensure minimal impurities, making it ideal for demanding applications in semiconductor manufacturing, thin-film deposition, and high-temperature environments. With a molecular formula of HfSi₂ and CAS number 12401-56-8, our Hafnium Silicide powder is available in various particle sizes and purities to meet specific research and industrial requirements. Its unique properties, including resistance to oxidation and excellent adhesion to substrates, make it a preferred choice for cutting-edge technologies.

Each batch undergoes rigorous quality control, including XRD and SEM analysis, to guarantee consistency and performance. Suitable for use in sputtering targets, diffusion barriers, and as a precursor in chemical vapor deposition (CVD), this material is packaged under inert conditions to preserve its integrity. Researchers and engineers can rely on our Hafnium Silicide for reproducible results in advanced material science and nanotechnology applications.

Properties

• CAS Number: 12401-56-8
• InChI: InChI=1S/Hf.2Si
• InChI Key: TWRSDLOICOIGRH-UHFFFAOYSA-N
• Exact Mass: 235.90041
• Molecular Formula: HfSi2
• Molecular Weight: 234.66
• SMILES: [Si].[Si].[Hf]
• Monoisotopic Mass: 235.90041
• Synonyms: Hafnium silicide, 12401-56-8, Hafnium silicide (HfSi2), EINECS 235-640-1, DTXCID201436981, DTXSID301014380, hafnium;silicon, Hafnium disilicide, TWRSDLOICOIGRH-UHFFFAOYSA-N, MFCD00167026, Chromium Sulfide (Cr2S3) Sputtering Targets, Q26841176

Application

Hafnium Silicide (HfSi₂) is widely used in the semiconductor industry as a conductive material for integrated circuits and microelectronics due to its low resistivity and compatibility with silicon substrates. It serves as an effective diffusion barrier in metallization processes, preventing unwanted reactions between layers in electronic devices. Additionally, its thermal stability makes it suitable for high-temperature coatings and protective layers in aerospace and energy applications.

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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.