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Atomfair Diiodosilane H2I2Si CAS 13760-02-6
Diiodosilane (H2I2Si) is a highly reactive inorganic compound primarily used in semiconductor and advanced materials research. This volatile silicon halide features two iodine atoms bonded to a central silicon atom, making it a valuable precursor for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. With a CAS number of 13760-02-6, our high-purity Diiodosilane is rigorously tested to ensure minimal impurities, making it ideal for thin-film fabrication, nanotechnology applications, and silicon-based material synthesis. Packaged under inert gas to preserve stability, this compound is handled exclusively in controlled environments to maintain its integrity. Suitable for researchers and industrial scientists working…
Description
Diiodosilane (H2I2Si) is a highly reactive inorganic compound primarily used in semiconductor and advanced materials research. This volatile silicon halide features two iodine atoms bonded to a central silicon atom, making it a valuable precursor for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. With a CAS number of 13760-02-6, our high-purity Diiodosilane is rigorously tested to ensure minimal impurities, making it ideal for thin-film fabrication, nanotechnology applications, and silicon-based material synthesis. Packaged under inert gas to preserve stability, this compound is handled exclusively in controlled environments to maintain its integrity. Suitable for researchers and industrial scientists working on cutting-edge electronic and optoelectronic devices.
Properties
- CAS Number: 13760-02-6
- Complexity: 2.8
- IUPAC Name: diiodosilane
- InChI: InChI=1S/H2I2Si/c1-3-2/h3H2
- InChI Key: AIHCVGFMFDEUMO-UHFFFAOYSA-N
- Exact Mass: 283.80152
- Molecular Formula: H2I2Si
- Molecular Weight: 283.910
- SMILES: [SiH2](I)I
- Monoisotopic Mass: 283.80152
- Synonyms: Diiodosilane, DTXSID30928708, DTXCID301357473, 626-077-6, 13760-02-6, 13465-83-3, SCHEMBL432461, Diiodosilane pound DIS pound(c), SY249172, Diiodosilane, contains copper as stabilizer, DB-297189
Application
Diiodosilane is widely employed in the deposition of silicon-containing thin films for semiconductor devices, including transistors and photovoltaic cells. Its high reactivity makes it a preferred choice for low-temperature CVD processes, enabling precise control over film stoichiometry. Researchers also utilize it in the synthesis of silicon-based nanomaterials and as a doping agent in advanced electronics.
Safety and Hazards
GHS Hazard Statements
- H226 (97.6%): Flammable liquid and vapor [Warning Flammable liquids]
- H260 (97.6%): In contact with water releases flammable gases which may ignite spontaneously [Danger Substances and mixtures which in contact with water, emit flammable gases]
- H302 (100%): Harmful if swallowed [Warning Acute toxicity, oral]
- H312 (100%): Harmful in contact with skin [Warning Acute toxicity, dermal]
- H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
- H332 (100%): Harmful if inhaled [Warning Acute toxicity, inhalation]
Precautionary Statements
- P210, P223, P231+P232, P233, P240, P241, P242, P243, P260, P261, P264, P270, P271, P280, P301+P317, P301+P330+P331, P302+P335+P334, P302+P352, P302+P361+P354, P303+P361+P353, P304+P340, P305+P354+P338, P316, P317, P321, P330, P362+P364, P363, P370+P378, P402+P404, P403+P235, P405, and P501
Hazard Classes and Categories
- Flam. Liq. 3 (97.6%)
- Water-react. 1 (97.6%)
- Acute Tox. 4 (100%)
- Acute Tox. 4 (100%)
- Skin Corr. 1B (100%)
- Acute Tox. 4 (100%)
If you are interested or have any questions, please contact us at support@atomfair.com
Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.
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