Description

Bis(T-butylsulfonyl)diazomethane (CAS No. 138529-84-7) is a highly specialized organic compound with the molecular formula C₉H₁₈N₂O₄S₂. Its IUPAC name is 2-[tert-butylsulfonyl(diazo)methyl]sulfonyl-2-methylpropane, indicating its unique sulfonyl-diazo functional groups. This compound is a valuable reagent in synthetic organic chemistry, particularly in photolithography and polymer crosslinking applications. It is characterized by its stability under controlled conditions and its ability to act as a photoacid generator (PAG) in advanced resist formulations. Bis(T-butylsulfonyl)diazomethane is supplied as a high-purity solid, ensuring consistent performance in sensitive chemical processes. Proper handling under inert conditions is recommended due to its reactive diazo moiety.

Properties

• CAS Number: 138529-84-7
• Complexity: 496
• IUPAC Name: 2-[tert-butylsulfonyl(diazo)methyl]sulfonyl-2-methyl-propane
• InChI: InChI=1S/C9H18N2O4S2/c1-8(2,3)16(12,13)7(11-10)17(14,15)9(4,5)6/h1-6H3
• InChI Key: SAFWZKVQMVOANB-UHFFFAOYSA-N
• Exact Mass: 282.07079941
• Molecular Formula: C9H18N2O4S2
• Molecular Weight: 282.4
• SMILES: CC(C)(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(C)(C)C
• Topological: 87
• Monoisotopic Mass: 282.07079941
• Synonyms: BIS(T-BUTYLSULFONYL)DIAZOMETHANE, 138529-84-7, 2-[tert-butylsulfonyl(diazo)methyl]sulfonyl-2-methylpropane, Propane, 2,2′-[(diazomethylene)bis(sulfonyl)]bis[2-methyl-, SCHEMBL36657, DTXSID70619168, SAFWZKVQMVOANB-UHFFFAOYSA-N, 2-[Diazo(2-methylpropane-2-sulfonyl)methanesulfonyl]-2-methylpropane

Application

Bis(T-butylsulfonyl)diazomethane is primarily used as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. Its decomposition under UV light releases acidic species, enabling high-resolution patterning in lithography. The compound also finds utility in polymer chemistry as a crosslinking agent for specialty resins. Researchers employ it in organic synthesis for its ability to generate carbenes under thermal or photolytic conditions.

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