Atomfair Bis(cyclohexylsulfonyl)diazomethane C13H22N2O4S2

Description Bis(cyclohexylsulfonyl)diazomethane (CAS No. 138529-81-4) is a highly specialized chemical compound with the molecular formula C13H22N2O4S2. Its IUPAC name, [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane, reflects its unique structural configuration featuring two cyclohexylsulfonyl groups bonded to a diazomethane core. This compound is meticulously synthesized for advanced research applications, particularly in photolithography and polymer chemistry, where its photoactive properties are highly valued. With a purity grade suitable for laboratory and industrial use, it is supplied in stable, well-sealed packaging to ensure integrity and longevity. Researchers and scientists can rely on this high-quality reagent for precise and reproducible results in sensitive chemical processes.

Description

Bis(cyclohexylsulfonyl)diazomethane (CAS No. 138529-81-4) is a highly specialized chemical compound with the molecular formula C₁₃H₂₂N₂O₄S₂. Its IUPAC name, [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane, reflects its unique structural configuration featuring two cyclohexylsulfonyl groups bonded to a diazomethane core. This compound is meticulously synthesized for advanced research applications, particularly in photolithography and polymer chemistry, where its photoactive properties are highly valued. With a purity grade suitable for laboratory and industrial use, it is supplied in stable, well-sealed packaging to ensure integrity and longevity. Researchers and scientists can rely on this high-quality reagent for precise and reproducible results in sensitive chemical processes.

CAS No: 138529-81-4
Molecular Formula: C13H22N2O4S2
Molecular Weight: 334.5
Exact Mass: 334.10209953
Monoisotopic Mass: 334.10209953
IUPAC Name: [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane
SMILES: C1CCC(CC1)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C2CCCCC2
Synonyms: BIS(CYCLOHEXYLSULFONYL)DIAZOMETHANE, 138529-81-4, DTXSID50453623, DTXCID40404442, 689-810-9

Application

Bis(cyclohexylsulfonyl)diazomethane is primarily utilized as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing and microfabrication. Its ability to decompose under UV irradiation, releasing strong acids, makes it indispensable in advanced lithographic techniques. Additionally, it finds applications in polymer crosslinking and as a catalyst in specific organic synthesis reactions. Researchers also explore its potential in surface modification and thin-film deposition processes.

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