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Atomfair 6N High Purity N-Type Silicon Sputtering Target (Si)
This 6N (99.9999%) high purity N-Type Silicon Sputtering Target is designed for precision thin film deposition processes. Available in multiple diameters and thicknesses with low resistivity (<0.0001Ω·cm) or moderate resistivity (1-10Ω·cm) options. Each target is individually packed and ready for immediate use in semiconductor and research applications.
Description
This 6N (99.9999%) high purity N-Type Silicon Sputtering Target is designed for precision thin film deposition processes. Available in multiple diameters and thicknesses with low resistivity (<0.0001Ω·cm) or moderate resistivity (1-10Ω·cm) options. Each target is individually packed and ready for immediate use in semiconductor and research applications.
Product Specifications
| Type | Diameter (mm) | Thickness (mm) | Resistivity | Packing | Pack Size |
|---|---|---|---|---|---|
| N-Type Silicon | 50.8 | 3 | <0.0001Ω·cm | Piece | 1 |
| N-Type Silicon | 50.8 | 4 | <0.0001Ω·cm | Piece | 1 |
| N-Type Silicon | 50.8 | 5 | <0.0001Ω·cm | Piece | 1 |
| N-Type Silicon | 50.8 | 6 | <0.0001Ω·cm | Piece | 1 |
| N-Type Silicon | 50.8 | 3 | 1-10Ω·cm | Piece | 1 |
| N-Type Silicon | 50.8 | 4 | 1-10Ω·cm | Piece | 1 |
| N-Type Silicon | 50.8 | 5 | 1-10Ω·cm | Piece | 1 |
| N-Type Silicon | 50.8 | 6 | 1-10Ω·cm | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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