Atomfair 6N High Purity Intrinsic Silicon Sputtering Target (P-Type/N-Type/Undoped)

Ultra-high purity (99.9999% or 6N) intrinsic silicon sputtering targets available in P-type, N-type, and undoped variants. Precision-engineered for thin film deposition applications with multiple diameter and thickness options. Ideal for semiconductor, photovoltaic, and research applications requiring controlled resistivity.

Description

Ultra-high purity (99.9999% or 6N) intrinsic silicon sputtering targets available in P-type, N-type, and undoped variants. Precision-engineered for thin film deposition applications with multiple diameter and thickness options. Ideal for semiconductor, photovoltaic, and research applications requiring controlled resistivity.

Type Diameter (mm) Thickness (mm) Resistivity Package
P-Type Silicon 50.8 3 <0.0001 ฮฉยทcm 1 pc per pack
50.8 4 <0.0001 ฮฉยทcm
50.8 5 <0.0001 ฮฉยทcm
50.8 6 <0.0001 ฮฉยทcm
P-Type Silicon 50.8 3 1-10 ฮฉยทcm
50.8 4 1-10 ฮฉยทcm
50.8 5 1-10 ฮฉยทcm
50.8 6 1-10 ฮฉยทcm
N-Type Silicon 50.8 3 <0.0001 ฮฉยทcm
50.8 4 <0.0001 ฮฉยทcm
50.8 5 <0.0001 ฮฉยทcm
50.8 6 <0.0001 ฮฉยทcm
N-Type Silicon 50.8 3 1-10 ฮฉยทcm
50.8 4 1-10 ฮฉยทcm
50.8 5 1-10 ฮฉยทcm
50.8 6 1-10 ฮฉยทcm
Intrinsic Silicon 50.8 3
50.8 4
50.8 5
50.8 6
60 3
60 4
60 5
60 6
Intrinsic Silicon 76.2 3
76.2 4
76.2 5
76.2 6
76.2 3 >30 ฮฉ
76.2 4 >30 ฮฉ
76.2 5 >30 ฮฉ
76.2 6 >30 ฮฉ

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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