Atomfair 6-inch GaN-on-Sapphire HEMT Epitaxial Wafer Sapphire 6 inch Uniformity Excellent Breakdown Voltage High Buffer Leakage Very Low

Silicon has long been a key semiconductor for most electronic applications, yet it is less efficient than silicon carbide (SiC) wafers. Now adopted in diverse uses-especially electric vehicles-SiC wafers address energy and cost challenges in developing high-efficiency, high-power devices. Composed of pure silicon and carbon, they outperform silicon in three key aspects: higher critical avalanche breakdown field, greater thermal conductivity, and wider bandgap (3eV). They withstand 8x higher voltage gradients than silicon, have lower high-temperature leakage current, higher current density, thinner structures (1/10 the thickness of silicon epitaxial layers), and lower conduction loss (10x higher doping concentration than silicon).

Description

Characteristics
Substrate Material Sapphire
Diameter 6 inch
Uniformity Excellent
Breakdown Voltage High
Buffer Leakage Very Low
Electron Concentration High
Electron Mobility High
Sheet Resistance Low

Largest format sapphire-based HEMT wafers for high-volume production applications.