Description
4-(Trifluoromethyl)-1-indanone (CAS No. 68755-42-0) is a high-purity fluorinated organic compound with the molecular formula C10H7F3O. This versatile indanone derivative features a trifluoromethyl group at the 4-position, enhancing its reactivity and utility in synthetic chemistry. Ideal for researchers and industrial scientists, this compound serves as a key intermediate in pharmaceuticals, agrochemicals, and advanced material synthesis. Its rigid bicyclic structure and electron-withdrawing trifluoromethyl group make it valuable for constructing complex molecules. Available in various quantities with guaranteed purity and stability, this product is rigorously tested via GC/MS, NMR, and HPLC to meet stringent quality standards.
Properties
- CAS Number: 68755-42-0
- Complexity: 246
- IUPAC Name: 4-(trifluoromethyl)indan-1-one
- InChI: InChI=1S/C10H7F3O/c11-10(12,13)8-3-1-2-7-6(8)4-5-9(7)14/h1-3H,4-5H2
- InChI Key: LJVBFMQEZSEGRL-UHFFFAOYSA-N
- Exact Mass: 200.04489933
- Molecular Formula: C10H7F3O
- Molecular Weight: 200.16
- SMILES: C1CC(=O)C2=C1C(=CC=C2)C(F)(F)F
- Topological: 17.1
- Monoisotopic Mass: 200.04489933
- Synonyms: 4-(Trifluoromethyl)-1-indanone, 68755-42-0, 4-trifluoromethyl-1-INDANONE, 4-(TRIFLUOROMETHYL)-2,3-DIHYDRO-1H-INDEN-1-ONE, 4-(trifluoromethyl)-2,3-dihydroinden-1-one, MFCD07772121, 4-(trifluoromethyl)indan-1-one, 4-trifluoromethyl-indan-1-one, 1H-Inden-1-one, 2,3-dihydro-4-(trifluoromethyl)-, 4-(Trifluoromethyl)-2,3-dihydro-1-indenone, SCHEMBL1508269, DTXSID10620112, CS-B1062, AKOS015853090, 4-(Trifluoromethyl)-1-indanone, 97%, DS-13974, SY107459, DB-074068, EN300-6497595
Application
4-(Trifluoromethyl)-1-indanone is widely used as a building block in medicinal chemistry for developing bioactive molecules, particularly in CNS-targeting drugs. Its trifluoromethyl group improves metabolic stability and lipophilicity, making it valuable in agrochemical formulations. The compound also serves as a precursor in material science for synthesizing fluorinated polymers with enhanced thermal and chemical resistance.
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