Description

4-Hydroxynaphthyldimethylsulfonium triflate (CAS No. 195057-83-1) is a high-purity sulfonium salt with the molecular formula C₁₃H₁₃F₃O₄S₂. This compound, also known by its IUPAC name (4-hydroxynaphthalen-1-yl)-dimethylsulfanium;trifluoromethanesulfonate, is a specialized reagent designed for advanced synthetic and photochemical applications. Its unique structure combines a hydroxynaphthyl group with a reactive sulfonium moiety, making it an excellent precursor for photoacid generators (PAGs) in lithography and polymer chemistry. With a triflate counterion, it offers superior solubility in organic solvents and enhanced stability under various conditions. Ideal for researchers in materials science, organic synthesis, and photoresist development, this product is rigorously tested to ensure consistency and performance. Available in customizable quantities, it is packaged under inert conditions to maintain purity and shelf life.

Properties

• CAS Number: 195057-83-1
• Complexity: 337
• IUPAC Name: (4-hydroxy-1-naphthyl)-dimethyl-sulfonium;trifluoromethanesulfonate
• InChI: InChI=1S/C12H12OS.CHF3O3S/c1-14(2)12-8-7-11(13)9-5-3-4-6-10(9)12;2-1(3,4)8(5,6)7/h3-8H,1-2H3;(H,5,6,7)
• InChI Key: KQTKIMROWOIVHW-UHFFFAOYSA-N
• Exact Mass: 354.02073573
• Molecular Formula: C13H13F3O4S2
• Molecular Weight: 354.4
• SMILES: C[S+](C)C1=CC=C(C2=CC=CC=C21)O.C(F)(F)(F)S(=O)(=O)[O-]
• Topological: 86.8
• Monoisotopic Mass: 354.02073573
• Synonyms: SCHEMBL36124, 195057-83-1, 4-Hydroxynaphthyldimethylsulfonium triflate, DB-381258

Application

4-Hydroxynaphthyldimethylsulfonium triflate is primarily used as a photoacid generator (PAG) in advanced photoresist formulations for semiconductor lithography, where it decomposes upon UV exposure to release strong acids for pattern development. It also serves as a key intermediate in organic synthesis, particularly for constructing sulfonium-based functional materials. Researchers leverage its reactivity in polymer crosslinking and cationic polymerization processes.

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