Description

(3,3′-Difluoro-[2,2′-bithiophene]-5,5′-diyl)bis(trimethylsilane) (CAS: 1619967-07-5) is a high-purity organosilicon compound with the molecular formula C₁₄H₂₀F₂S₂Si₂. This specialized chemical features a bithiophene core symmetrically functionalized with fluorine atoms and trimethylsilyl groups, offering unique electronic and steric properties. The compound is particularly valuable in materials science for the development of advanced organic semiconductors, conductive polymers, and optoelectronic materials. Its rigid, planar structure and electron-withdrawing fluorine substituents make it an excellent building block for π-conjugated systems. Supplied as a crystalline solid with >95% purity (HPLC), this reagent is rigorously tested for moisture sensitivity and stored under inert gas to ensure stability. Ideal for cross-coupling reactions, this compound serves as a key intermediate in the synthesis of novel thiophene-based materials for OLEDs, OFETs, and photovoltaic applications.

Properties

• CAS Number: 1619967-07-5
• Complexity: 320
• IUPAC Name: [4-fluoro-5-(3-fluoro-5-trimethylsilyl-2-thienyl)-2-thienyl]-trimethyl-silane
• InChI: InChI=1S/C14H20F2S2Si2/c1-19(2,3)11-7-9(15)13(17-11)14-10(16)8-12(18-14)20(4,5)6/h7-8H,1-6H3
• InChI Key: BBPKQPLFOQUQPA-UHFFFAOYSA-N
• Exact Mass: 346.05130238
• Molecular Formula: C14H20F2S2Si2
• Molecular Weight: 346.6
• SMILES: C[Si](C)(C)C1=CC(=C(S1)C2=C(C=C(S2)[Si](C)(C)C)F)F
• Topological: 56.5
• Monoisotopic Mass: 346.05130238
• Synonyms: 1619967-07-5, (3,3′-Difluoro-[2,2′-bithiophene]-5,5′-diyl)bis(trimethylsilane)

Application

This fluorinated bithiophene derivative serves as a critical precursor in the synthesis of high-performance organic electronic materials. Researchers utilize its symmetrical structure to create conjugated polymers with enhanced charge transport properties for thin-film transistors. The compound’s fluorine substituents enable fine-tuning of HOMO/LUMO levels in donor-acceptor copolymers for photovoltaic applications. In materials science, it functions as a building block for self-assembled monolayers (SAMs) on silicon surfaces. The trimethylsilyl groups provide both steric protection and synthetic handles for further functionalization through desilylation reactions.

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