Description
2,2-Dimethyl-3,6,9,12-tetraoxa-2-silatridecane (CAS: 864079-62-9) is a high-purity organosilicon compound with the molecular formula C10H24O4Si. Also known as 2-[2-(2-methoxyethoxy)ethoxy]ethoxy-trimethylsilane, this specialty chemical features a unique silatrane backbone with a polyether chain, making it highly versatile for surface modification and functionalization applications. Its trimethylsilyl (TMS) group enhances stability while the oligo(ethylene glycol) moiety provides solubility in polar and non-polar solvents. This compound is ideal for researchers working on silane coupling agents, polymer additives, or surface coatings. Packaged under inert conditions to ensure purity and longevity, it is suitable for advanced material science, nanotechnology, and organic synthesis.
Properties
- CAS Number: 864079-62-9
- Complexity: 136
- IUPAC Name: 2-[2-(2-methoxyethoxy)ethoxy]ethoxy-trimethyl-silane
- InChI: InChI=1S/C10H24O4Si/c1-11-5-6-12-7-8-13-9-10-14-15(2,3)4/h5-10H2,1-4H3
- InChI Key: LGPOIKHOZYPSME-UHFFFAOYSA-N
- Exact Mass: 236.14438578
- Molecular Formula: C10H24O4Si
- Molecular Weight: 236.38
- SMILES: COCCOCCOCCO[Si](C)(C)C
- Topological: 36.9
- Monoisotopic Mass: 236.14438578
- Synonyms: 864079-62-9, 2,2-Dimethyl-3,6,9,12-tetraoxa-2-silatridecane, 3,6,9,12-Tetraoxa-2-silatridecane, 2,2-dimethyl-, 2-[2-(2-Methoxyethoxy)ethoxy]ethoxy-trimethylsilane, Methyltrioxitol, TMS derivative, MFCD00054875, ANL-1NM3, SCHEMBL892809, DTXSID80732812, LGPOIKHOZYPSME-UHFFFAOYSA-N, AS-88283, F73216, 2,2-Dimethyl-3,6,9,12-tetroxa-2-silatridecane
Application
This compound is widely used as a silane coupling agent for modifying surfaces, particularly in the preparation of hydrophilic or hydrophobic coatings. Its polyether chain enables compatibility with polymers, making it valuable in formulating adhesives and sealants. Researchers also employ it in organic synthesis as a protecting group or as a precursor for functionalized siloxanes. Additionally, it finds applications in nanomaterials for stabilizing nanoparticles or creating self-assembled monolayers (SAMs).
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