Your cart is currently empty!

Atomfair 2-inch GaN-on-SiC HEMT Epitaxial Wafer Silicon Carbide (SiC) 2 inch Lattice Mismatch 3.50% Thermal Expansion Difference 25% 5×10 8/cm2
Silicon has long been a key semiconductor for most electronic applications, yet it is less efficient than silicon carbide (SiC) wafers. Now adopted in diverse uses-especially electric vehicles-SiC wafers address energy and cost challenges in developing high-efficiency, high-power devices. Composed of pure silicon and carbon, they outperform silicon in three key aspects: higher critical avalanche breakdown field, greater thermal conductivity, and wider bandgap (3eV). They withstand 8x higher voltage gradients than silicon, have lower high-temperature leakage current, higher current density, thinner structures (1/10 the thickness of silicon epitaxial layers), and lower conduction loss (2x higher doping concentration than silicon).
Description
| Specifications | |
|---|---|
| Substrate Material | Silicon Carbide (SiC) |
| Diameter | 2 inch |
| Lattice Mismatch | 3.50% |
| Thermal Expansion Difference | 25% |
| Defect Density | 5×108/cm2 |
| Leakage Current | High |
| Integration Potential | Medium |
Combines SiC’s excellent thermal conductivity with GaN’s high-frequency and low-loss characteristics. Ideal for RF applications including 5G base stations and defense sector power amplifiers.
Related products
-
Atomfair 10*10mm Silicon Carbide (SiC) Substrate
-
Atomfair 2 inch diameter Silicon Carbide (SiC) Substrate
-
Atomfair 2-inch GaN Single Crystal Wafer (N-type) GaN-FS 2 inch≤2cm-2 400±50 μm C-axis(0001)±0.5° TTV ≤15μm BOW≤20μm
-
Atomfair 2-inch GaN-on-Sapphire HEMT Epitaxial Wafer Sapphire 2 inch Uniformity Excellent Breakdown Voltage High Buffer Leakage Very Low
-
Atomfair 2-inch GaN-on-Sapphire HEMT Epitaxial Wafer Sapphire 2 inch Uniformity Excellent Breakdown Voltage High Buffer Leakage Very Low
