Description
2-([1,1′-Biphenyl]-2-yloxy)ethyl acrylate (CAS No. 72009-86-0) is a high-purity specialty chemical with the molecular formula C17H16O3 and IUPAC name 2-(2-phenylphenoxy)ethyl prop-2-enoate. This compound is an acrylate ester derivative featuring a biphenyl ether linkage, offering unique reactivity for polymerization and crosslinking applications. It is supplied as a clear to pale yellow liquid with a characteristic mild odor, suitable for advanced organic synthesis and material science research. The product is rigorously tested for quality, including GC analysis to ensure ≥95% purity, and is packaged under inert gas to maintain stability. Ideal for use in photoresists, adhesives, and specialty coatings, this monomer provides excellent compatibility with UV-curable formulations and other acrylate-based systems.
Properties
- CAS Number: 72009-86-0
- Complexity: 307
- IUPAC Name: 2-(2-phenylphenoxy)ethyl prop-2-enoate
- InChI: InChI=1S/C17H16O3/c1-2-17(18)20-13-12-19-16-11-7-6-10-15(16)14-8-4-3-5-9-14/h2-11H,1,12-13H2
- InChI Key: VAZQKPWSBFZARZ-UHFFFAOYSA-N
- Exact Mass: 268.109944368
- Molecular Formula: C17H16O3
- Molecular Weight: 268.31
- SMILES: C=CC(=O)OCCOC1=CC=CC=C1C2=CC=CC=C2
- Topological: 35.5
- Monoisotopic Mass: 268.109944368
- Physical Description: Liquid
- Synonyms: 91442-24-9, 2-([1,1′-Biphenyl]-2-yloxy)ethyl acrylate, 72009-86-0, 2-Propenoic acid 2-([1,1′-biphenyl]-2-yloxy)ethyl ester, 2-PHENYLPHENOXYETHYL ACRYLATE, 2-([1,1/’-Biphenyl]-2-yloxy)ethyl acrylate, 2-(2-PHENYLPHENOXY)ETHYL PROP-2-ENOATE, 2-Propenoic acid, 2-([1,1′-biphenyl]-2-yloxy)ethyl ester, 2-([1,1′-Biphenyl]-2-yloxy)ethylacrylate, o-phenylphenoxyethyl acrylate, SCHEMBL534826, VAZQKPWSBFZARZ-UHFFFAOYSA-N, DTXSID601320423, MFCD23105740, BS-49929, DB-203504, B6308, E70363, 2-([1,1′-Biphenyl]-2-yloxy)ethyl Acrylate (stabiliZed with MEHQ)
Application
2-([1,1′-Biphenyl]-2-yloxy)ethyl acrylate is primarily used as a reactive monomer in UV-curable coatings, inks, and adhesives, where its biphenyl moiety enhances rigidity and thermal stability. It also serves as a key intermediate in the synthesis of advanced polymers for electronic materials, such as photoresists in semiconductor manufacturing. Researchers utilize this compound to modify surface properties or create crosslinked networks with tailored mechanical and optical characteristics.
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