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Deposition & Thin-Film Materials
Showing 257–272 of 381 results
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Atomfair High Purity Single Crystal Silicon Wafer (100 Orientation) – Intrinsic & Doped (P/N-Type) for Semiconductor Applications
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Atomfair High Purity Strontium Titanate (SrTiO3) Sputtering Target, 4N (99.9%)
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Atomfair High Purity TA1 Titanium Rod, ฯ40 x 140mm Polished Surface
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Atomfair High Purity Tantalum Carbide (TaC) Sputtering Target, 99.5% (3N5), Various Dimensions with Optional Copper Backing
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Atomfair High Purity Tantalum Carbide Powder (TaC) – 99.5% Pure, 1.5-2ฮผm Particle Size
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Atomfair High Purity Tantalum Metal Lump (99.95%, 4N, 10-50mm Irregular Pieces)
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Atomfair High Purity Tantalum Nitride (TaN) Sputtering Target 99.5% (3N5) for Thin Film Deposition
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Atomfair High Purity Tantalum Nitride Powder (TaN), 99.5%, 200 Mesh
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Atomfair High Purity Tantalum Powder (Ta) – 99.95% & 99.9% Grade for Industrial Applications
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Atomfair High Purity Tellurium (Te) Granules – 4N & 5N Grade, Spherical & Irregular Shapes
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Atomfair High Purity Tellurium Lump (Te) 5N (99.999%) – Distilled, 10-50mm
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Atomfair High Purity Tellurium Powder (4N, 99.99%) – 1-10ฮผm Particle Size
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Atomfair High Purity Tin (Sn) Sputtering Target – 4N (99.99%) & 5N (99.999%) Available
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Atomfair High Purity Tin Oxide (SnO2) Granules, 4N (99.99%) 1-3mm
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Atomfair High Purity Tin Powder (Sn) – 99.9% Pure, 300 Mesh & 800 Mesh Options
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Atomfair High Purity Tin Silver Bismuth Alloy Sputtering Target (SnAgBi, 64/1/35 at%, 4N)