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Deposition & Thin-Film Materials
Showing 177–192 of 381 results
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Atomfair High Purity Iron Boride Alloy Lump (FeB) – Fe/B 80/20 at% 99.9% & FeB18% 99% Options
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Atomfair High Purity Iron Carbon Alloy Lump (FeC 5%, 4N Purity)
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Atomfair High Purity Iron Gallium Alloy (FeGa) Particles, 99.9% (3N), Fe/Ga=81/19 wt%, <10mm
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Atomfair High Purity Iron Manganese Alloy Sputtering Target (Fe/Mn 95/5 at%, 99.8% Purity)
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Atomfair High Purity Iron Rod (4N/5N Grade) – Various Sizes for Laboratory & Industrial Use
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Atomfair High Purity Iron Sheet (Fe) 99.9% – 100x100x1mm
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Atomfair High Purity Iron-Zirconium Alloy Lump (FeZr, Fe/Zr=1/1 wt%, 4N-5N Purity)
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Atomfair High Purity Lanthanum Fluoride (LaF3) Sputtering Target 99.9% (4N) for Thin Film Deposition
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Atomfair High Purity Lanthanum Titanate (LaTiO3) Sputtering Target, 99.9% (3N)
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Atomfair High Purity Lanthanum-Copper Alloy Lump (LaCu 4/96 wt%) – 4N Copper Base
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Atomfair High Purity Lead (Pb) Powder – 99.9% Pure, 300 Mesh
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Atomfair High Purity Lithium Carbonate (Li2CO3) Sputtering Target 99.9% (3N)
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Atomfair High Purity Lithium Niobate (LiNbO3) Sputtering Target, 99.9% (3N), 25mm Diameter x 6mm Thickness
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Atomfair High Purity Lithium Tantalate (LiTaO3) Sputtering Target 4N (99.9%) – Various Sizes with Optional Copper Backing
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Atomfair High Purity Lithium Titanate (LiTiO3) Sputtering Target 99.9% (4N)
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Atomfair High Purity Magnesium Oxide (MgO) Crystalline & Sintered Granules – 4N/5N Grade