Deposition & Thin-Film Materials
Showing 257–272 of 384 results
-
Atomfair High Purity Silver Powder (Ag) 99.9% (3N) – Fine Powder Form
-
Atomfair High Purity Silver-Copper Alloy (AgCu 50/1) Irregular Granules, 99.9% Purity, 1-10mm
-
Atomfair High Purity Silver-Tin Alloy Lump (AgSn 10/90 wt%, 4N Purity)
-
Atomfair High Purity Single Crystal Silicon Wafer (100 Orientation) – Intrinsic & Doped (P/N-Type) for Semiconductor Applications
-
Atomfair High Purity Strontium Titanate (SrTiO3) Sputtering Target, 4N (99.9%)
-
Atomfair High Purity TA1 Titanium Rod, φ40 x 140mm Polished Surface
-
Atomfair High Purity Tantalum Carbide (TaC) Sputtering Target, 99.5% (3N5), Various Dimensions with Optional Copper Backing
-
Atomfair High Purity Tantalum Carbide Powder (TaC) – 99.5% Pure, 1.5-2μm Particle Size
-
Atomfair High Purity Tantalum Metal Lump (99.95%, 4N, 10-50mm Irregular Pieces)
-
Atomfair High Purity Tantalum Nitride (TaN) Sputtering Target 99.5% (3N5) for Thin Film Deposition
-
Atomfair High Purity Tantalum Nitride Powder (TaN), 99.5%, 200 Mesh
-
Atomfair High Purity Tantalum Powder (Ta) – 99.95% & 99.9% Grade for Industrial Applications
-
Atomfair High Purity Tellurium (Te) Granules – 4N & 5N Grade, Spherical & Irregular Shapes
-
Atomfair High Purity Tellurium Lump (Te) 5N (99.999%) – Distilled, 10-50mm
-
Atomfair High Purity Tellurium Powder (4N, 99.99%) – 1-10μm Particle Size
-
Atomfair High Purity Tin (Sn) Sputtering Target – 4N (99.99%) & 5N (99.999%) Available