Description

Germanium Tetrafluoride (GeF₄) is a high-purity inorganic compound widely utilized in semiconductor manufacturing, optical fiber production, and specialty chemical synthesis. This colorless, toxic gas exhibits excellent reactivity as a fluorinating agent and is critical in the deposition of germanium-containing thin films for advanced electronics. With a molecular formula of F₄Ge and CAS No. 7783-58-6, our product is synthesized under stringent quality controls to ensure ≥99.9% purity, validated by GC-MS and FTIR analysis. Packaged in corrosion-resistant cylinders with ultra-high purity (UHP) valves to maintain integrity. Compatible with CVD/ALD systems and meets SEMI/SGS standards for trace metal impurities (<1 ppb).

Key Specifications:
• Molecular Weight: 148.58 g/mol
• Melting Point: -15°C
• Boiling Point: -36.5°C (sublimes)
• Density: 6.074 g/L (gas, 25°C)
• DOT Classification: 2.3 (Poison Gas)
• Storage: Steel cylinders at ≤25°C

Properties

• CAS Number: 7783-58-6
• Complexity: 19.1
• IUPAC Name: tetrafluorogermane
• InChI: InChI=1S/F4Ge/c1-5(2,3)4
• InChI Key: PPMWWXLUCOODDK-UHFFFAOYSA-N
• Exact Mass: 149.9147904
• Molecular Formula: F4Ge
• Molecular Weight: 148.62
• SMILES: F[Ge](F)(F)F
• Monoisotopic Mass: 149.9147904
• Physical Description: This material is a toxic gas that is somewhat similar to silicon tetrafluoride and is expected to behave in a similar fashion. See the chemical datasheet for silicon tetrafluoride for more information.
• Synonyms: Tetrafluorogermane, 7783-58-6, Germane, tetrafluoro-, Germanium tetrafluoride, Germanium fluoride (GeF4), X83T8V2NRK, EINECS 232-011-3, DTXSID1064829, GERMANIUM TETRAFLUORIDE [MI], Germanium fluoride, Germyl tetrafluoride, Germane, tetrafluoro, Germanium (IV) fluoride, DTXCID7048031, UN3304, 232-011-3, 62566-74-9, 810-256-2, Germanium(IV) fluoride, GeF4, Germanium(iv)fluoride, UNII-X83T8V2NRK, Ge F4, SCHEMBL1684973, Germanium(IV) fluoride, 99.95%, MFCD00042536, SBB086610, AKOS025310463, NS00080379, Germanium(IV) fluoride, electronic grade, >=99.9%

Application

Germanium tetrafluoride serves as a precursor for germanium epitaxial growth in semiconductor devices, enabling precise doping of silicon-germanium (SiGe) alloys. In fiber optics, it facilitates vapor-phase deposition of germanium-doped silica cores to enhance refractive index profiles. The compound also finds use in organic synthesis as a selective fluorinating agent for silicon-germanium hybrid materials.

Safety and Hazards

GHS Hazard Statements

• H280 (100%): Contains gas under pressure; may explode if heated [Warning Gases under pressure]
• H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
• H318 (100%): Causes serious eye damage [Danger Serious eye damage/eye irritation]
• H330 (50%): Fatal if inhaled [Danger Acute toxicity, inhalation]
• H331 (50%): Toxic if inhaled [Danger Acute toxicity, inhalation]
• H362 (50%): May cause harm to breast-fed children [Reproductive toxicity, effects on or via lactation]
• H370 (50%): Causes damage to organs [Danger Specific target organ toxicity, single exposure]
• H372 (50%): Causes damage to organs through prolonged or repeated exposure [Danger Specific target organ toxicity, repeated exposure]

Precautionary Statements

• P203, P260, P261, P263, P264, P264+P265, P270, P271, P280, P284, P301+P330+P331, P302+P361+P354, P304+P340, P305+P354+P338, P308+P316, P316, P317, P318, P319, P320, P321, P363, P403+P233, P405, P410+P403, and P501

Hazard Classes and Categories

• Press. Gas (100%)
• Skin Corr. 1B (100%)
• Eye Dam. 1 (100%)
• Acute Tox. 2 (50%)
• Acute Tox. 3 (50%)
• Lact. (50%)
• STOT SE 1 (50%)
• STOT RE 1 (50%)

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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.