Description

Trimethylaluminum (TMA) is a highly reactive organoaluminum compound with the molecular formula C₃H₉Al (Al(CH₃)₃). This pyrophoric liquid is widely utilized in chemical vapor deposition (CVD), atomic layer deposition (ALD), and as a catalyst in polymerization reactions. Its ultra-high purity variants (≥99.9999%) are essential for semiconductor manufacturing, OLED displays, and advanced materials synthesis. Packaged in electropolished Swagelok cylinders or hexane/toluene solutions (1M-2M), it ensures safe handling for industrial and research applications. CAS 75-24-1 | UN 1103 (Class 4.2).

Properties

• CAS Number: 75-24-1
• Complexity: 8
• IUPAC Name: trimethylalumane
• InChI: InChI=1S/3CH3.Al/h3*1H3;
• InChI Key: JLTRXTDYQLMHGR-UHFFFAOYSA-N
• Exact Mass: 72.0519637
• Molecular Formula: C3H9Al
• Molecular Weight: 72.09
• SMILES: C[Al](C)C
• Monoisotopic Mass: 72.0519637
• Physical Description: Liquid
• Vapor Pressure: 12.4 [mmHg]
• Synonyms: Trimethylaluminum, 75-24-1, TRIMETHYLALUMINIUM, Aluminum, trimethyl-, trimethylalumane, Trimethylalane, trimethyl aluminum, ALUMINUM TRIMETHYL, Aluminum trimethanide, (CH3)3Al, EINECS 200-853-0, BRN 3587197, AV210LG46J, TRIMETHYLALUMINUM [MI], DTXSID9058787, EC 200-853-0, 4-04-00-04397 (Beilstein Handbook Reference), TRIMETHYLALUMINUM (AL(CH3)3), Aluminum, trimethyl, DTXCID6047735, 200-853-0, MFCD00008252, C3H9Al, UNII-AV210LG46J, trimethyaluminum, trimethyaluminium, trimethylalumimum, trimethylaiuminium, tri-methylaluminum, trimethy aluminium, trimethyl-aluminum, trirnethylaluminium, trimethyl aluminium, trimethyl-aluminium, tri-methyl aluminum, AlMe3, Me3Al, tri-methyl aluminium, Trimethylaluminum, 97%, Al(Me)3, SCHEMBL3314, Al(CH3)3, Trimethylaluminum, elec. gr., Trimethylaluminum 2M in Hexanes, Trimethylaluminum 2M in Toluene, Trimethylaluminum, 1M in heptane, Trimethylaluminum, 2M in heptane, Trimethylaluminum, 2M in toluene, AKOS015915463, Trimethylaluminum, 25% w/w in hexane, UN 1103, NS00079066, T0782, T1575, A838359, Q416321, Trimethylaluminum, packaged for use in deposition systems, Trimethylaluminum – Prepackaged in cylinder for ALD/CVD, Trimethylaluminum, electronic grade, >=99.9999% (ultra pure), Trimethylaluminum, elec.gr.;(99.999+%-Al) PURATREM, in 50 ml electropolished Swagelok cylinder (96-1077) for CVD/ALD

Trimethylaluminum serves as a key precursor in ALD/CVD for depositing aluminum oxide films in microelectronics and optoelectronics. It acts as a co-catalyst in Ziegler-Natta polymerization for polyolefin production. In organic synthesis, it methylates electrophiles and activates carbonyl groups. Pyrophoric; requires inert atmosphere handling.

Safety and Hazards

GHS Hazard Statements

• H250 (98.9%): Catches fire spontaneously if exposed to air [Danger Pyrophoric liquids]
• H260 (98.6%): In contact with water releases flammable gases which may ignite spontaneously [Danger Substances and mixtures which in contact with water, emit flammable gases]
• H314 (98.9%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
• H318 (41.4%): Causes serious eye damage [Danger Serious eye damage/eye irritation]

Precautionary Statements

• P210, P222, P223, P231, P231+P232, P233, P260, P264, P264+P265, P280, P301+P330+P331, P302+P335+P334, P302+P361+P354, P304+P340, P305+P354+P338, P316, P317, P321, P363, P370+P378, P402+P404, P405, and P501

Hazard Classes and Categories

• Pyr. Liq. 1 (98.9%)
• Water-react. 1 (98.6%)
• Skin Corr. 1B (98.9%)
• Eye Dam. 1 (41.4%)

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Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.