Description

4,4′-Bis(4-aminophenoxy)benzophenone (CAS No. 30184-96-4) is a high-purity aromatic compound with the molecular formula C₂₅H₂₀N₂O₃. This advanced chemical, also known by its IUPAC name bis[4-(4-aminophenoxy)phenyl]methanone, features a benzophenone core symmetrically substituted with two 4-aminophenoxy groups. The compound is characterized by its excellent thermal stability and reactivity, making it a valuable intermediate in high-performance polymer synthesis. Available in crystalline form with >98% purity (HPLC), it is rigorously tested for consistency in melting point (typically 160-165°C) and molecular weight (396.45 g/mol). Packaged under inert gas in amber glass vials to prevent degradation, this specialty chemical is ideal for research in advanced material science applications.

Properties

• CAS Number: 30184-96-4
• Complexity: 479
• IUPAC Name: bis[4-(4-aminophenoxy)phenyl]methanone
• InChI: InChI=1S/C25H20N2O3/c26-19-5-13-23(14-6-19)29-21-9-1-17(2-10-21)25(28)18-3-11-22(12-4-18)30-24-15-7-20(27)8-16-24/h1-16H,26-27H2
• InChI Key: LSDYQEILXDCDTR-UHFFFAOYSA-N
• Exact Mass: 396.14739250
• Molecular Formula: C25H20N2O3
• Molecular Weight: 396.4
• SMILES: C1=CC(=CC=C1C(=O)C2=CC=C(C=C2)OC3=CC=C(C=C3)N)OC4=CC=C(C=C4)N
• Topological: 87.6
• Monoisotopic Mass: 396.14739250
• Synonyms: 30184-96-4, 4,4′-Bis(4-aminophenoxy)benzophenone, bis[4-(4-aminophenoxy)phenyl]methanone, Methanone, bis[4-(4-aminophenoxy)phenyl]-, Bis(4-(4-aminophenoxy)phenyl)methanone, 4,4′-Bis-(4-aminophenoxy)benzophenone, SCHEMBL201750, 4,4-BIS(4-AMINOPHENOXY)BENZOPHENONE(4BABP), DTXSID30559157, LSDYQEILXDCDTR-UHFFFAOYSA-N, FB36704

Application

4,4′-Bis(4-aminophenoxy)benzophenone serves as a critical monomer for synthesizing polyimides and polyamides with enhanced thermal resistance, particularly in aerospace and microelectronics applications. Its bifunctional amino groups enable copolymerization with dianhydrides to create high-temperature adhesives and insulating films. The compound’s ether linkages contribute to improved solubility in polar aprotic solvents during polymer processing. Researchers also utilize it to develop photosensitive resins for advanced lithography techniques.

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