Description

Diphenyl 4-tertbutylphenylsulfonium nonafluorobutanesulfonate (CAS No. 258872-05-8) is a high-purity sulfonium salt with the molecular formula C₂₆H₂₃F₉O₃S₂. This specialized compound is widely recognized for its role as a photoacid generator (PAG) in advanced photoresist formulations, particularly in semiconductor lithography and microelectronics manufacturing. Its IUPAC name, (4-tert-butylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate, reflects its unique structural features, including a tert-butylphenyl group and a nonafluorobutanesulfonate counterion, which contribute to its excellent solubility and thermal stability. This product is rigorously tested for purity, consistency, and performance, making it ideal for research and industrial applications requiring precise acid generation under UV or deep-UV exposure. Packaged under inert conditions to ensure stability, it is suitable for use in chemically amplified resists (CARs) and other high-resolution patterning systems.

Properties

• CAS Number: 258872-05-8
• Complexity: 692
• IUPAC Name: (4-tert-butylphenyl)-diphenyl-sulfonium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• InChI: InChI=1S/C22H23S.C4HF9O3S/c1-22(2,3)18-14-16-21(17-15-18)23(19-10-6-4-7-11-19)20-12-8-5-9-13-20;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h4-17H,1-3H3;(H,14,15,16)/q+1;/p-1
• InChI Key: GXZZZWUTJCPYHC-UHFFFAOYSA-M
• Exact Mass: 618.09449040
• Molecular Formula: C26H23F9O3S2
• Molecular Weight: 618.6
• SMILES: CC(C)(C)C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F
• Topological: 66.6
• Monoisotopic Mass: 618.09449040
• Synonyms: 258872-05-8, Diphenyl 4-tertbutylphenylsulfonium nonafluorobutanesulfonate, (4-(tert-Butyl)phenyl)diphenylsulfonium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate, (4-tert-butylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate, SCHEMBL384049, GXZZZWUTJCPYHC-UHFFFAOYSA-M, DB-141705, Diphenyl 4-tert-butylphenylsulfonium nonafluorobutanesulfonate

Application

Diphenyl 4-tertbutylphenylsulfonium nonafluorobutanesulfonate is primarily used as a photoacid generator (PAG) in photolithography for semiconductor fabrication, where it enables high-resolution patterning through acid-catalyzed reactions. Its nonafluorobutanesulfonate counterion enhances solubility in organic solvents, making it compatible with advanced resist formulations. This compound is also employed in UV-curable coatings and microelectronics packaging due to its efficient acid release and thermal stability. Researchers value its consistent performance in chemically amplified resists (CARs) for next-generation lithography techniques.

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