Description

Perfluoro-4-methyl-2-pentene (CAS 2070-70-4) is a high-purity fluorinated olefin with the molecular formula C₆F₁₂, widely utilized in advanced research and industrial applications. This compound features exceptional thermal stability, chemical inertness, and low surface energy, making it ideal for specialized applications in electronics, coatings, and aerospace industries. Its unique perfluorinated structure ensures superior resistance to harsh environments, including extreme temperatures and aggressive chemicals. Packaged under inert gas to maintain stability, our Perfluoro-4-methyl-2-pentene is rigorously tested to meet the highest standards of purity and performance, ensuring reliable results for researchers and engineers.

Properties

• CAS Number: 2070-70-4
• Complexity: 323
• IUPAC Name: 1,1,1,2,3,4,5,5,5-nonafluoro-4-(trifluoromethyl)pent-2-ene
• InChI: InChI=1S/C6F12/c7-1(2(8)4(10,11)12)3(9,5(13,14)15)6(16,17)18
• InChI Key: SAPOZTRFWJZUFT-UHFFFAOYSA-N
• Exact Mass: 299.9808379
• Molecular Formula: C6F12
• Molecular Weight: 300.04
• SMILES: C(=C(C(F)(F)F)F)(C(C(F)(F)F)(C(F)(F)F)F)F
• Monoisotopic Mass: 299.9808379
• Synonyms: 2070-70-4, Perfluoro-4-methyl-2-pentene, DTXSID30880175, DTXCID601021762, 671-459-8, perfluoro(4-methylpent-2-ene), 2-Pentene, 1,1,1,2,3,4,5,5,5-nonafluoro-4-(trifluoromethyl)-, 4-(Trifluoromethyl)perfluoro-2-pentene, perfluoro-4-methylpent-2-ene, SCHEMBL333298, 1,1,1,2,3,4,5,5,5-nonafluoro-4-(trifluoromethyl)-2-pentene, (CF3)2CF-C(F)=C(F)CF3, Nonafluoro-4-trifluoromethyl-2-pentene, DB-045343, NS00018843, A814826, 1,1,1,2,3,4,5,5,5-nonafluoro-4-trifluoromethyl-pent-2-ene, 1,1,1,2,3,4,5,5,5-nonakis(fluoranyl)-4-(trifluoromethyl)pent-2-ene

Perfluoro-4-methyl-2-pentene is commonly employed as a precursor in the synthesis of high-performance fluoropolymers and specialty chemicals. Its robust chemical properties make it suitable for use in dielectric fluids, heat transfer agents, and hydrophobic coatings. Researchers also utilize this compound in the development of advanced materials for semiconductor manufacturing and aerospace applications due to its exceptional stability and low reactivity.

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