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Atomfair hafnium(IV) acetylacetonate Hf(acac)4 C20H32HfO8 CAS 17475-67-1
Hafnium(IV) Acetylacetonate (CAS No. 17475-67-1) is a high-purity coordination compound with the molecular formula C20H32HfO8. This organometallic precursor features hafnium (IV) ions chelated by four acetylacetonate ligands, ensuring excellent stability and solubility in organic solvents. Ideal for chemical vapor deposition (CVD), atomic layer deposition (ALD), and sol-gel processes, this compound is widely used in the synthesis of advanced ceramics, thin-film coatings, and nanomaterials. With a purity of 97% or higher, it meets stringent research and industrial standards, making it a reliable choice for catalysis, electronics, and high-performance material applications. Packaged under inert conditions to prevent degradation.
Description
Hafnium(IV) Acetylacetonate (CAS No. 17475-67-1) is a high-purity coordination compound with the molecular formula C20H32HfO8. This organometallic precursor features hafnium (IV) ions chelated by four acetylacetonate ligands, ensuring excellent stability and solubility in organic solvents. Ideal for chemical vapor deposition (CVD), atomic layer deposition (ALD), and sol-gel processes, this compound is widely used in the synthesis of advanced ceramics, thin-film coatings, and nanomaterials. With a purity of 97% or higher, it meets stringent research and industrial standards, making it a reliable choice for catalysis, electronics, and high-performance material applications. Packaged under inert conditions to prevent degradation.
Properties
- CAS Number: 17475-67-1
- Complexity: 529
- IUPAC Name: hafnium;(Z)-4-hydroxypent-3-en-2-one
- InChI: InChI=1S/4C5H8O2.Hf/c4*1-4(6)3-5(2)7;/h4*3,6H,1-2H3;/b4*4-3-;
- InChI Key: XFRUSXFSJAEXPU-MTOQALJVSA-N
- Exact Mass: 580.15628
- Molecular Formula: C20H32HfO8
- Molecular Weight: 578.9
- SMILES: C/C(=C/C(=O)C)/O.C/C(=C/C(=O)C)/O.C/C(=C/C(=O)C)/O.C/C(=C/C(=O)C)/O.[Hf]
- Topological: 149
- Monoisotopic Mass: 580.15628
- Synonyms: Hafnium acetylacetonate, 17475-67-1, hafnium;(Z)-4-hydroxypent-3-en-2-one, hafnium(IV) acetylacetonate, MFCD00044997, HAFNIUM(IV) 2,4-PENTANEDIONATE, Hafnium() acetylacetonate, 97%, AKOS002375128, Hafnium,tetrakis(2,4-pentanedionato-kO2,kO4)-,(SA-8-11”11”1’1”’1’1”’)-, G77631
Hafnium(IV) acetylacetonate is primarily used as a precursor for hafnium oxide thin films in semiconductor manufacturing via CVD/ALD. It also serves as a catalyst in organic synthesis and polymerization reactions. Researchers utilize it in sol-gel processes to produce high-k dielectric materials for microelectronics. Its thermal stability makes it suitable for ceramic and nanocomposite fabrication.
Safety and Hazards
GHS Hazard Statements
- H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
- H319 (100%): Causes serious eye irritation [Warning Serious eye damage/eye irritation]
- H335 (100%): May cause respiratory irritation [Warning Specific target organ toxicity, single exposure; Respiratory tract irritation]
Precautionary Statements
- P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501
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