Description

Triphenylsulfonium nonafluorobutanesulfonate (CAS No. 144317-44-2) is a high-purity sulfonium salt widely utilized in advanced photoresist formulations and lithographic processes. With the molecular formula C₂₂H₁₅F₉O₃S₂, this compound serves as a highly efficient photoacid generator (PAG) in chemically amplified resists for semiconductor manufacturing. Its IUPAC name, 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium, reflects its unique chemical structure, which combines a thermally stable triphenylsulfonium cation with a nonafluorobutanesulfonate anion for superior acid generation upon UV or deep-UV exposure. This product is characterized by its exceptional thermal stability, low volatility, and high solubility in common organic solvents, making it ideal for spin-coating applications. Packaged under inert conditions to ensure stability, our Triphenylsulfonium nonafluorobutanesulfonate meets rigorous industry standards for purity and performance in microelectronics fabrication.

Properties

• CAS Number: 144317-44-2
• Complexity: 576
• IUPAC Name: 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfonium
• InChI: InChI=1S/C18H15S.C4HF9O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h1-15H;(H,14,15,16)/q+1;/p-1
• InChI Key: VLLPVDKADBYKLM-UHFFFAOYSA-M
• Exact Mass: 562.03189014
• Molecular Formula: C22H15F9O3S2
• Molecular Weight: 562.5
• SMILES: C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F
• Topological: 66.6
• Monoisotopic Mass: 562.03189014
• Synonyms: 144317-44-2, triphenylsulfonium nonafluorobutanesulfonate, 477-300-7, Triphenylsulfonium nonaflate, Triphenylsulphonium nonaflate, Sulfonium, triphenyl-, 1,1,2,2,3,3,4,4,4-nonafluoro-1-butanesulfonate (1:1), Triphenylsulfonium perfluoro-1-butanesufonate, 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium, MFCD02683476, SCHEMBL51399, DTXSID40881875, BCP18068, AKOS015914700, AS-73310, NS00110266, T3038, triphenylsulfanium nonafluorobutane-1-sulfonate, triphenylsulfonium nonafluoro-1-butanesulfonate, E85611, Triphenylsulfonium nonafluoro n-butane sulfonate, Triphenylsulfonium perfluoro-1-butanesufonate, electronic grade, >=99%

Application

Triphenylsulfonium nonafluorobutanesulfonate is primarily employed as a photoacid generator in chemically amplified photoresists for advanced lithography processes, including EUV and 248nm/193nm photolithography. It enables high-resolution patterning in semiconductor device fabrication by efficiently generating strong acid upon exposure to UV light. The compound’s excellent thermal stability and low outgassing properties make it particularly suitable for high-temperature processing steps. Its application extends to advanced packaging and MEMS manufacturing where precise pattern transfer is critical.

Safety and Hazards

GHS Hazard Statements

• H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
• H319 (100%): Causes serious eye irritation [Warning Serious eye damage/eye irritation]
• H335 (75%): May cause respiratory irritation [Warning Specific target organ toxicity, single exposure; Respiratory tract irritation]

Precautionary Statements

• P261, P264, P264+P265, P271, P280, P302+P352, P304+P340, P305+P351+P338, P319, P321, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501

Hazard Classes and Categories

• Acute Tox. 3 (58.5%)
• Skin Irrit. 2 (100%)
• Eye Irrit. 2 (100%)
• STOT SE 3 (100%)

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