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Atomfair Hafnium tetrachloride HfCl4 Cl4Hf CAS 13499-05-3
Hafnium Tetrachloride (HfCl4) is a high-purity inorganic compound widely utilized in advanced material synthesis and chemical research. This hygroscopic solid appears as white to off-white crystals and is a critical precursor in the production of hafnium-based ceramics, coatings, and catalysts. With a molecular formula of Cl4Hf and CAS number 13499-05-3, it exhibits exceptional reactivity, making it indispensable in vapor deposition processes such as CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition). Our product is rigorously tested for purity, ensuring optimal performance in semiconductor fabrication, optical coatings, and nuclear applications. Store under inert conditions to maintain stability and prevent hydrolysis.
Description
Hafnium Tetrachloride (HfCl4) is a high-purity inorganic compound widely utilized in advanced material synthesis and chemical research. This hygroscopic solid appears as white to off-white crystals and is a critical precursor in the production of hafnium-based ceramics, coatings, and catalysts. With a molecular formula of Cl4Hf and CAS number 13499-05-3, it exhibits exceptional reactivity, making it indispensable in vapor deposition processes such as CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition). Our product is rigorously tested for purity, ensuring optimal performance in semiconductor fabrication, optical coatings, and nuclear applications. Store under inert conditions to maintain stability and prevent hydrolysis.
Properties
- CAS Number: 13499-05-3
- Complexity: 19.1
- IUPAC Name: tetrachlorohafnium
- InChI: InChI=1S/4ClH.Hf/h4*1H;/q;;;;+4/p-4
- InChI Key: PDPJQWYGJJBYLF-UHFFFAOYSA-J
- Exact Mass: 321.81902
- Molecular Formula: Cl4Hf
- Molecular Weight: 320.3
- SMILES: Cl[Hf](Cl)(Cl)Cl
- Monoisotopic Mass: 319.82197
- Physical Description: Dry Powder
- Synonyms: Hafnium tetrachloride, 13499-05-3, Hafnium(IV) chloride, tetrachlorohafnium, Hafnium chloride (HfCl4), (T-4)-, EINECS 236-826-5, CNZ9V5JM5H, 37230-84-5, EC 236-826-5, DTXCID0034273, DTXSID201044330, Hafnium chloride (HfCl4), (T4), 236-826-5, dtxsid0065513, hafnium chloride, hafnium tetrachloride [mi], HfCl4, UNII-CNZ9V5JM5H, Hafnium IV Chloride, SCHEMBL52605, Hafnium(IV) chloride, 98%, Hafnium(IV) chloride, sublimed grade, Hafnium(IV) chloride, purified by sublimation, Hafnium(IV) chloride, purum, >=97% (AT), D94750, Q2628977, Hafnium(IV) chloride, purified by sublimation, 99.9% trace metals basis, Hafnium chloride powder, -100 mesh approx 99.9% purity (metals basis) Zr < 0.5%
Application
Hafnium tetrachloride is primarily used as a precursor for depositing hafnium oxide (HfO2) thin films in semiconductor devices, enhancing dielectric properties. It also serves as a catalyst in organic synthesis and polymerization reactions. In nuclear industries, HfCl4 is employed for neutron absorption due to hafnium’s high cross-section. Additionally, it finds applications in specialty glass and ceramic production for its refractory characteristics.
Safety and Hazards
GHS Hazard Statements
- H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
- H317 (17.3%): May cause an allergic skin reaction [Warning Sensitization, Skin]
Precautionary Statements
- P260, P261, P264, P272, P280, P301+P330+P331, P302+P352, P302+P361+P354, P304+P340, P305+P354+P338, P316, P321, P333+P317, P362+P364, P363, P405, and P501
Hazard Classes and Categories
- Skin Corr. 1B (100%)
- Skin Sens. 1 (17.3%)
If you are interested or have any questions, please contact us at support@atomfair.com
Disclaimer: Sold exclusively for laboratory research. Prohibited for commercial use, diagnostics, or human/animal applications. Buyers assume all compliance liability.
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