Description

(4-Methylphenyl)(2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate (CAS No. 1204518-02-4) is a highly specialized iodonium salt with the molecular formula C₁₇H₁₈F₃IO₃S. This compound is widely recognized for its role as a photoacid generator (PAG) in advanced photoresist formulations, particularly in semiconductor manufacturing and UV-curable coatings. Its unique structure, featuring a mesityl and p-tolyl group bound to an iodonium center paired with a triflate anion, ensures excellent solubility in organic solvents and efficient photodecomposition under UV exposure. With high thermal stability and low volatility, it is ideal for precision lithography applications. Packaged under inert conditions to ensure purity and longevity, this reagent meets the stringent requirements of research and industrial processes.

Properties

• CAS Number: 1204518-02-4
• Complexity: 362
• IUPAC Name: p-tolyl-(2,4,6-trimethylphenyl)iodonium;trifluoromethanesulfonate
• InChI: InChI=1S/C16H18I.CHF3O3S/c1-11-5-7-15(8-6-11)17-16-13(3)9-12(2)10-14(16)4;2-1(3,4)8(5,6)7/h5-10H,1-4H3;(H,5,6,7)/q+1;/p-1
• InChI Key: KVLSSMIQFXWHII-UHFFFAOYSA-M
• Exact Mass: 485.99735
• Molecular Formula: C17H18F3IO3S
• Molecular Weight: 486.3
• SMILES: CC1=CC=C(C=C1)[I+]C2=C(C=C(C=C2C)C)C.C(F)(F)(F)S(=O)(=O)[O-]
• Topological: 65.6
• Monoisotopic Mass: 485.99735
• Synonyms: (4-Methylphenyl)(2,4,6-trimethylphenyl)iodonium trifluoromethanesulfonate, 694-753-8, 1204518-02-4, (4-Methylphenyl)(2,4,6-trimethylphenyl)iodonium triflate, Mesityl(p-tolyl)iodonium triflate, Mesityl(p-tolyl)iodonium trifluoromethanesulfonate, (4-methylphenyl)-(2,4,6-trimethylphenyl)iodanium;trifluoromethanesulfonate, MFCD20264882, DTXSID00746456, KVLSSMIQFXWHII-UHFFFAOYSA-M, AKOS025294169, AS-85374, M2909, T71632, Mesityl(p-tolyl)iodoniumtrifluoromethanesulfonate, (4-Methylphenyl)(2,4,6-trimethylphenyl)iodanium trifluoromethanesulfonate, (4-Methylphenyl)(2,4,6-trimethylphenyl)iodonium triflate, >=98.0% (HPLC)

Application

This iodonium salt is primarily used as a photoacid generator (PAG) in chemically amplified photoresists for semiconductor lithography, enabling high-resolution patterning. It also finds application in UV-curing systems for coatings and adhesives, where it initiates cationic polymerization upon exposure. Additionally, researchers utilize it in organic synthesis as a mild Lewis acid catalyst or arylating agent.

Safety and Hazards

GHS Hazard Statements

• H301 (97.4%): Toxic if swallowed [Danger Acute toxicity, oral]
• H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
• H319 (100%): Causes serious eye irritation [Warning Serious eye damage/eye irritation]
• H335 (97.4%): May cause respiratory irritation [Warning Specific target organ toxicity, single exposure; Respiratory tract irritation]

Precautionary Statements

• P261, P264, P264+P265, P270, P271, P280, P301+P316, P302+P352, P304+P340, P305+P351+P338, P319, P321, P330, P332+P317, P337+P317, P362+P364, P403+P233, P405, and P501

Hazard Classes and Categories

• Acute Tox. 3 (97.4%)
• Skin Irrit. 2 (100%)
• Eye Irrit. 2 (100%)
• STOT SE 3 (97.4%)

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