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Atomfair PAG108-Octane sulfonyl C21H26N2O3S2

Description PAG108-Octane sulfonyl (CAS No. 852246-54-9) is a high-purity, specialized chemical compound with the molecular formula C21H26N2O3S2. Its IUPAC name is [(Z)-[(3Z)-3-[cyano-(2-methylphenyl)methylidene]thiophen-2-ylidene]amino] octane-1-sulfonate , indicating its complex sulfonate-based structure. This compound is meticulously synthesized for advanced research applications, particularly in photochemistry and materials science. It is supplied as a fine powder or crystalline solid with >98% purity (HPLC), ensuring consistency for sensitive experiments. Store in a cool, dry place away from light to maintain stability. Suitable for use in organic synthesis, catalysis studies, and as a photoacid generator (PAG) precursor.

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Description

Description

PAG108-Octane sulfonyl (CAS No. 852246-54-9) is a high-purity, specialized chemical compound with the molecular formula C21H26N2O3S2. Its IUPAC name is [(Z)-[(3Z)-3-[cyano-(2-methylphenyl)methylidene]thiophen-2-ylidene]amino] octane-1-sulfonate, indicating its complex sulfonate-based structure. This compound is meticulously synthesized for advanced research applications, particularly in photochemistry and materials science. It is supplied as a fine powder or crystalline solid with >98% purity (HPLC), ensuring consistency for sensitive experiments. Store in a cool, dry place away from light to maintain stability. Suitable for use in organic synthesis, catalysis studies, and as a photoacid generator (PAG) precursor.

  • CAS No: 852246-54-9
  • Molecular Formula: C21H26N2O3S2
  • Molecular Weight: 418.6
  • Exact Mass: 418.13848504
  • Monoisotopic Mass: 418.13848504
  • IUPAC Name: [(Z)-[(3Z)-3-[cyano-(2-methylphenyl)methylidene]thiophen-2-ylidene]amino] octane-1-sulfonate
  • SMILES: CCCCCCCCS(=O)(=O)O/N=C1/C(=C(C#N)/C2=CC=CC=C2C)/C=CS1
  • Synonyms: PAG108-Octane sulfonyl, SCHEMBL2023708

Application

PAG108-Octane sulfonyl is primarily employed as a photoacid generator (PAG) in advanced photoresist formulations for semiconductor lithography. Its unique sulfonate structure enables efficient acid release upon UV exposure, making it valuable for high-resolution patterning in microelectronics. Researchers also utilize it in polymer chemistry to study acid-catalyzed reactions. The compound’s extended octyl chain improves solubility in organic matrices compared to shorter-chain analogs.

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