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Atomfair Nitrogen trifluoride NF3 F3N

Description Nitrogen Trifluoride (NF3) is a highly reactive inorganic compound with the molecular formula F3N. This colorless, nonflammable gas is characterized by its strong oxidizing properties and is widely used in specialized industrial applications. With a CAS number of 7783-54-2, Nitrogen Trifluoride is manufactured to the highest purity standards, ensuring optimal performance in semiconductor and electronics manufacturing. Its stability under normal conditions makes it a reliable choice for precision processes, though it requires careful handling due to its reactivity with reducing agents. Packaged in high-quality, certified cylinders, our NF3is ideal for demanding research and production environments.

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Description

Description

Nitrogen Trifluoride (NF3) is a highly reactive inorganic compound with the molecular formula F3N. This colorless, nonflammable gas is characterized by its strong oxidizing properties and is widely used in specialized industrial applications. With a CAS number of 7783-54-2, Nitrogen Trifluoride is manufactured to the highest purity standards, ensuring optimal performance in semiconductor and electronics manufacturing. Its stability under normal conditions makes it a reliable choice for precision processes, though it requires careful handling due to its reactivity with reducing agents. Packaged in high-quality, certified cylinders, our NF3 is ideal for demanding research and production environments.

  • CAS No: 7783-54-2
  • Molecular Formula: F3N
  • Molecular Weight: 71.002
  • Exact Mass: 70.99828349
  • Monoisotopic Mass: 70.99828349
  • SMILES: N(F)(F)F
  • Synonyms: NITROGEN TRIFLUORIDE, Trifluoroamine, Nitrogen fluoride, Trifluoroammonia, 7783-54-2

Application

Nitrogen Trifluoride is primarily used as a fluorine source in plasma etching and cleaning of chemical vapor deposition (CVD) chambers in the semiconductor industry. It is also employed in the production of flat-panel displays and microelectromechanical systems (MEMS) due to its ability to selectively remove silicon and silicon nitride. Additionally, NF3 serves as a precursor in the synthesis of other fluorine-containing compounds, making it valuable in advanced material research.

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