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Atomfair Pentakis(dimethylamino)tantalum(V) PDMAT C10H30N5Ta

Description Pentakis(dimethylamino)tantalum(V) (CAS No. 19824-59-0) is a high-purity organometallic compound with the molecular formula C10H30N5Ta. This thermally stable, moisture-sensitive compound is widely used in advanced materials science and thin-film deposition processes, particularly in the semiconductor industry. As a liquid precursor, it offers excellent volatility and decomposition characteristics for atomic layer deposition (ALD) and chemical vapor deposition (CVD) of tantalum-containing films. The compound features five dimethylamino ligands coordinated to a central tantalum(V) center, providing unique reactivity for nanoscale material synthesis. Our product is rigorously tested to meet the highest standards of purity and consistency, with specialized packaging options available for air-sensitive…

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Description

Description

Pentakis(dimethylamino)tantalum(V) (CAS No. 19824-59-0) is a high-purity organometallic compound with the molecular formula C10H30N5Ta. This thermally stable, moisture-sensitive compound is widely used in advanced materials science and thin-film deposition processes, particularly in the semiconductor industry. As a liquid precursor, it offers excellent volatility and decomposition characteristics for atomic layer deposition (ALD) and chemical vapor deposition (CVD) of tantalum-containing films. The compound features five dimethylamino ligands coordinated to a central tantalum(V) center, providing unique reactivity for nanoscale material synthesis. Our product is rigorously tested to meet the highest standards of purity and consistency, with specialized packaging options available for air-sensitive materials.

  • CAS No: 19824-59-0
  • Molecular Formula: C10H30N5Ta
  • Molecular Weight: 401.33
  • Exact Mass: 401.19812
  • Monoisotopic Mass: 401.19812
  • IUPAC Name: dimethylazanide;tantalum(5+)
  • SMILES: C[N-]C.C[N-]C.C[N-]C.C[N-]C.C[N-]C.[Ta+5]
  • Synonyms: Pentakis(dimethylamino)tantalum(V), 624-567-4, 19824-59-0, Pentakis(dimethylamino)tantalum, Tantalum, pentakis(dimethylamino)-

Application

Pentakis(dimethylamino)tantalum(V) serves as a crucial precursor for depositing tantalum nitride (TaN) and tantalum oxide (Ta2O5) thin films in semiconductor manufacturing. It enables the production of diffusion barriers and high-k dielectric materials in advanced microelectronic devices. The compound is particularly valuable in atomic layer deposition processes where precise thickness control is required. Researchers also utilize it for developing specialized catalysts and investigating organometallic reaction mechanisms. Its applications extend to photonic materials and protective coatings for extreme environments.

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