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Atomfair Triphenylsulfonium nonafluorobutanesulfonate Triphenylsulfonium nonaflate C22H15F9O3S2

Description Triphenylsulfonium nonafluorobutanesulfonate (CAS No. 144317-44-2) is a high-purity sulfonium salt widely utilized in advanced photoresist formulations and lithographic processes. With the molecular formula C22H15F9O3S2, this compound serves as a highly efficient photoacid generator (PAG) in chemically amplified resists for semiconductor manufacturing. Its IUPAC name, 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium , reflects its unique chemical structure, which combines a thermally stable triphenylsulfonium cation with a nonafluorobutanesulfonate anion for superior acid generation upon UV or deep-UV exposure. This product is characterized by its exceptional thermal stability, low volatility, and high solubility in common organic solvents, making it ideal for spin-coating applications. Packaged under inert conditions…

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Description

Description

Triphenylsulfonium nonafluorobutanesulfonate (CAS No. 144317-44-2) is a high-purity sulfonium salt widely utilized in advanced photoresist formulations and lithographic processes. With the molecular formula C22H15F9O3S2, this compound serves as a highly efficient photoacid generator (PAG) in chemically amplified resists for semiconductor manufacturing. Its IUPAC name, 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium, reflects its unique chemical structure, which combines a thermally stable triphenylsulfonium cation with a nonafluorobutanesulfonate anion for superior acid generation upon UV or deep-UV exposure. This product is characterized by its exceptional thermal stability, low volatility, and high solubility in common organic solvents, making it ideal for spin-coating applications. Packaged under inert conditions to ensure stability, our Triphenylsulfonium nonafluorobutanesulfonate meets rigorous industry standards for purity and performance in microelectronics fabrication.

  • CAS No: 144317-44-2
  • Molecular Formula: C22H15F9O3S2
  • Molecular Weight: 562.5
  • Exact Mass: 562.03189014
  • Monoisotopic Mass: 562.03189014
  • IUPAC Name: 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium
  • SMILES: C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F
  • Synonyms: 144317-44-2, triphenylsulfonium nonafluorobutanesulfonate, 477-300-7, Triphenylsulfonium nonaflate, Triphenylsulphonium nonaflate

Application

Triphenylsulfonium nonafluorobutanesulfonate is primarily employed as a photoacid generator in chemically amplified photoresists for advanced lithography processes, including EUV and 248nm/193nm photolithography. It enables high-resolution patterning in semiconductor device fabrication by efficiently generating strong acid upon exposure to UV light. The compound’s excellent thermal stability and low outgassing properties make it particularly suitable for high-temperature processing steps. Its application extends to advanced packaging and MEMS manufacturing where precise pattern transfer is critical.

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