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Atomfair Hexahydro-4,7-methano-1H-indenyl acrylate C13H16O2

Description Hexahydro-4,7-methano-1H-indenyl acrylate (CAS No. 12542-30-2) is a high-purity specialty acrylate ester with the molecular formula C13H16O2and IUPAC name 3-tricyclo[5.2.1.02,6]dec-4-enyl prop-2-enoate . This compound features a unique tricyclic structure with an acrylate functional group, making it a valuable monomer for advanced polymer synthesis. Ideal for research and industrial applications, it is characterized by its high reactivity in radical polymerization and crosslinking reactions. Supplied as a clear liquid with >95% purity (GC), it is suitable for photoresists, adhesives, coatings, and other specialty materials. Store under inert atmosphere at 2-8??C to prevent premature polymerization.

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Description

Description

Hexahydro-4,7-methano-1H-indenyl acrylate (CAS No. 12542-30-2) is a high-purity specialty acrylate ester with the molecular formula C13H16O2 and IUPAC name 3-tricyclo[5.2.1.02,6]dec-4-enyl prop-2-enoate. This compound features a unique tricyclic structure with an acrylate functional group, making it a valuable monomer for advanced polymer synthesis. Ideal for research and industrial applications, it is characterized by its high reactivity in radical polymerization and crosslinking reactions. Supplied as a clear liquid with >95% purity (GC), it is suitable for photoresists, adhesives, coatings, and other specialty materials. Store under inert atmosphere at 2-8??C to prevent premature polymerization.

  • CAS No: 12542-30-2
  • Molecular Formula: C13H16O2
  • Molecular Weight: 204.26
  • Exact Mass: 204.115029749
  • Monoisotopic Mass: 204.115029749
  • IUPAC Name: 3-tricyclo[5.2.1.02,6]dec-4-enyl prop-2-enoate
  • SMILES: C=CC(=O)OC1C=CC2C1C3CCC2C3
  • Synonyms: Hexahydro-4,7-methano-1H-indenyl acrylate, EINECS 235-697-2, EC 235-697-2, 2-Propenoic acid, 3a,4,7,7a,?,?-hexahydro-4,7-methano-1H-indenyl ester, 235-697-2

Application

Hexahydro-4,7-methano-1H-indenyl acrylate is primarily used as a reactive diluent and crosslinking agent in UV-curable resins and adhesives. Its rigid tricyclic structure enhances thermal stability and mechanical properties in polymer matrices. Researchers utilize it to develop high-performance coatings with improved chemical resistance and hardness. The compound also finds niche applications in photolithography for semiconductor manufacturing.

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