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Atomfair Hexamethyldisiloxane HMDSO C6H18OSi2

Description Hexamethyldisiloxane (HMDSO) is a highly versatile organosilicon compound with the molecular formula C6H18OSi2. This clear, colorless liquid is characterized by its low viscosity, high volatility, and excellent thermal stability, making it a valuable reagent in industrial and laboratory applications. HMDSO is widely used as a precursor in plasma-enhanced chemical vapor deposition (PECVD) for thin-film coatings, as a surface modifier, and as a hydrophobic agent. Its inert nature and compatibility with organic and inorganic substrates ensure reliable performance in semiconductor manufacturing, nanotechnology, and polymer synthesis. With a CAS number 107-46-0, this compound is rigorously tested for purity and consistency, meeting…

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Description

Description

Hexamethyldisiloxane (HMDSO) is a highly versatile organosilicon compound with the molecular formula C6H18OSi2. This clear, colorless liquid is characterized by its low viscosity, high volatility, and excellent thermal stability, making it a valuable reagent in industrial and laboratory applications. HMDSO is widely used as a precursor in plasma-enhanced chemical vapor deposition (PECVD) for thin-film coatings, as a surface modifier, and as a hydrophobic agent. Its inert nature and compatibility with organic and inorganic substrates ensure reliable performance in semiconductor manufacturing, nanotechnology, and polymer synthesis. With a CAS number 107-46-0, this compound is rigorously tested for purity and consistency, meeting the stringent requirements of researchers and scientists.

  • CAS No: 107-46-0
  • Molecular Formula: C6H18OSi2
  • Molecular Weight: 162.38
  • Exact Mass: 162.08961826
  • Monoisotopic Mass: 162.08961826
  • IUPAC Name: trimethyl(trimethylsilyloxy)silane
  • SMILES: C[Si](C)(C)O[Si](C)(C)C
  • Synonyms: HEXAMETHYLDISILOXANE, 107-46-0, Disiloxane, hexamethyl-, Oxybis(trimethylsilane), HMDSO

Application

Hexamethyldisiloxane (HMDSO) is primarily employed in plasma deposition processes to create silicon oxide-based thin films for microelectronics and protective coatings. It serves as a key reagent in surface treatment applications, imparting water-repellent properties to glass, metals, and polymers. Additionally, HMDSO is utilized as a carrier fluid in heat transfer systems and as a intermediate in the synthesis of silicone-based materials.

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