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Atomfair 2,2,2-Trifluoroethyl acrylate C5H5F3O2
Description 2,2,2-Trifluoroethyl acrylate (CAS No. 407-47-6) is a high-purity fluorinated acrylate ester with the molecular formula C5H5F3O2. This specialized monomer is widely used in advanced polymer synthesis due to its unique trifluoroethyl group, which enhances chemical resistance, thermal stability, and surface properties in resulting materials. It is supplied as a clear, colorless liquid with a characteristic acrylic ester odor, and is stored under inert conditions to prevent premature polymerization. Ideal for research and industrial applications, this compound is rigorously tested for purity and consistency, making it a reliable choice for photoresists, coatings, adhesives, and specialty polymers. Handle with care in…
Description
Description
2,2,2-Trifluoroethyl acrylate (CAS No. 407-47-6) is a high-purity fluorinated acrylate ester with the molecular formula C5H5F3O2. This specialized monomer is widely used in advanced polymer synthesis due to its unique trifluoroethyl group, which enhances chemical resistance, thermal stability, and surface properties in resulting materials. It is supplied as a clear, colorless liquid with a characteristic acrylic ester odor, and is stored under inert conditions to prevent premature polymerization. Ideal for research and industrial applications, this compound is rigorously tested for purity and consistency, making it a reliable choice for photoresists, coatings, adhesives, and specialty polymers. Handle with care in a well-ventilated environment, using appropriate personal protective equipment (PPE).
- CAS No: 407-47-6
- Molecular Formula: C5H5F3O2
- Molecular Weight: 154.09
- Exact Mass: 154.02416388
- Monoisotopic Mass: 154.02416388
- IUPAC Name: 2,2,2-trifluoroethyl prop-2-enoate
- SMILES: C=CC(=O)OCC(F)(F)F
- Synonyms: 2,2,2-Trifluoroethyl acrylate, 407-47-6, 2-Propenoic acid, 2,2,2-trifluoroethyl ester, Acrylic acid, 2,2,2-trifluoroethyl ester, EINECS 206-987-6
Application
2,2,2-Trifluoroethyl acrylate is a key monomer in the synthesis of fluorinated polymers, offering improved chemical and thermal resistance for coatings and adhesives. It is particularly valuable in photolithography for semiconductor manufacturing, where its properties enhance photoresist performance. Researchers also utilize it to modify surface characteristics of materials for hydrophobic or low-friction applications.
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